1. Application: it is used to clean 6&8-inch epitaxial silicon wafers to remove particles, metal contamination and organic contamination on the surface of silicon wafers to meet the surface quality requirements of epitaxial wafers.
2、设备技术要求及参数
2. Technical requirements and parameters
2.1 采用多槽湿法清洗方式，进料、出料均为干燥状态。
2.1 Adopt multi tank wet cleaning method, and loadingand unloadingare in dry state.
2.1.1采用SC-1（NH4OH、H2O2、H2O）清洗去除硅片表面颗粒。
2.1.1 SC-1 (NH4OH, H2O2, H2O) was used to clean the surface particles of silicon wafer.
2.1.2采用SC-2（HCL、H2O2、H2O）、HF清洗去除硅片表面金属沾污。
2.1.2 SC-2 (HCl, H2O2, H2O) and HF were used to remove metal contamination on silicon wafer surface.
2.1.3采用含臭氧纯水清洗去除有机物。
2.1.3 Ozone-containing pure water wasused to clean and remove organic matter.
2.1.4 After the chemical tank (SC-1, SC-2, HF), rinse with large flow of pure water, quickly drain or overflow to remove the chemical residue on the surface of the silicon wafer.
2.1.5清洗结束后，使用慢提拉和红外干燥配合对硅片进行完全干燥。
2.1.5 After cleaning, use Hot DI Dryand infrared drying to completely dry the silicon wafer.
The first HF tank is used to clean the waferwith buried layer, with HF concentration of 5-20%, and the second HF tank is used to clean the epitaxial wafer, with HF concentration of 0.1-1%.
Table 1 Cleaner Configurationof Each Tank
No.1
No.2
No.3
No.4
No.5
No.6
O3
HF（High concentration）
HF（Low concentration）
OVF＆QDR
SC-1
SC-1
HF 5%-20%
HF 0.1%-1%
NH4OH、H2O2
NH4OH、H2O2
With lid
With lid
With lid
With lid
Megasonic
Megasonic
No.7
No.8
No.9
No.10
No.11
No.12
OVF＆QDR
SC-2
OVF＆QDR
OVF
Hot DI Dry
Infrared Drying
HCl、H2O2
With lid
Megasonic
Megasonic
Megasonic
Megasonic
*2.1.7清洗方式：cassette-less无片篮清洗。
*2.1.7 Cleaning method: Cassette-less cleaning without basket.
*2.1.8 Cleaning room, loading and unloading position settings:（It must be able to put into the room for normal use . If the length of the cleaneris less than 8.5meters, the unloading position is placed on the right side）.
Fig.1 Clean room layout
2.2上料台技术参数
2.2 Technical parameters of loadingposition
2.2.1装载片篮数量：6、8英寸片篮各4个，片篮为Entegris公司生产的PFA片篮。
2.2.1 Number of loading Baskets: 4 six inch baskets，and 4 eight inch baskets, which are PFA baskets produced by Entegris company.
2.2.2 The loading position shall be equipped with electrostatic removal device (for ISO CLASS3 purification, the discharge needle tip shall be made of monocrystalline silicon material, so as not to cause metal contamination, and the unloading position shall also be required), and SIMCO ion brand shall be designated.
*2.2.3 The loading position can load two boxes of 6-inch (50 pieces) or two boxes of 8-inch (50 pieces) silicon chips; automatically identify and adjust all the 6 / 8-inch settings in the following steps.
2.2.4 上料位6英寸硅片需要有自动倒片装置。
2.2.4 Automatic wafer transfer device is required for 6-inch wafer at Loading position.
2.3 SC-1清洗槽技术参数
2.3 Technical parameters of SC-1 tank
2.3.1工艺加热温度：稳定时(40 ~80) ± 1 ℃。
2.3.1 Process heating temperature: when stable (40 ~ 80) ± 1 ℃.
2.3.2达到设定工艺温度需要的时间：15 min以内
2.3.2 Time required to reach the set emperature: within 15 min.
2.3.3槽体上盖：上盖主体为耐高温材料，长期使用不变形，且不对清洗造成污染。
2.3.3 Tank body upper lid: The main body of the upper lidis made of high temperature resistant material, which will not deform after long-term use and will not cause pollution to cleaning.
2.3.5 Circulation pipeline: There are online heaters and filtering devices. The components in the circulation system and the circulation pipelines, joints, valves, sealing rings, etc. have the characteristics of resisting chemical corrosion, and do not introduce any contamination.
2.3.6循环量：循环流量最大可设定值不低于18L/min。
2.3.6 Circulation volume: the maximum settable value of circulation flow is not less than 18L/min.
2.3.7Filter: Install a filter in the circulation system, and leave enough space to facilitate the replacement of the filter element. The filter element has an Entegris brand filter element with a pore size of 0.05 μm.
2.3.8兆声功能：频率约950kHz，功率匹配，具备全天24小时连续工作能力。(KAIJO)
2.3.8Megasound function: frequency is about 950 kHz, power matching, with 24-hour continuous working ability.(KAIJO)
2.3.9Chemical liquid supply: The chemical liquids NH4OH and H2O2 are accurately supplied through a metering pump. The program can set the interval and each supply amount of the metering pump to replenish the chemical liquid.
2.3.10热纯水罐：工艺加热温度：(40~ 80) ±5℃，程序可设定开始加热时间点。
2.3.10 Hot pure water tank: Process heating temperature: (40 ~ 80) ± 5 ℃, the program can set the starting heating time point.
2.3.11硅片托架材质：耐酸碱、高温、长寿命、不沾污槽内液体及硅片。
2.3.11Silicon wafer carrier material: acid and alkali resistance, high temperature, long life, no contamination of the liquid in the tank and the silicon wafer.
2.3.12清洗槽自冲洗功能:换液前需注满纯水循环冲洗一次(可以人为设定是否需要冲洗)。
2.3.12The self-flushing function of the cleaning tank: it needs to be filled with pure water and rinsed once before the liquid is changed (you can manually set whether to rinse or not).
2.4SC-2槽技术参数
2.4 Technical parameters of SC-2 tank.
2.4.1工艺加热温度：稳定时(30 ~70) ± 1 ℃。
2.4.1 Process heating temperature: when stable (30 ~ 70) ± 1 ℃.
2.4.2达到设定工艺温度需要的时间：15 min以内。
2.4.2 Time required to reach the set temperature: within 15 min.
2.4.3槽体上盖：上盖主体为耐高温材料，长期使用不变形，且不对清洗造成污染。
2.4.3 Tank body upper cover: The main body of the upper cover is made of high temperature resistant material, which will not deform after long-term use and will not cause pollution to cleaning.
2.4.5 Circulation pipeline: There are online heaters and filtering devices. The components in the circulation system and the circulation pipelines, joints, valves, sealing rings, etc. have the characteristics of resisting chemical corrosion, and do not introduce any contamination.
2.4.6循环量：循环流量最大可设定值不低于18 L/min。
2.4.6 Circulation volume: the maximum settable value of circulation flow is not less than 18L/min.
2.4.7Filter: Install a filter in the circulation system, and leave enough space to facilitate the replacement of the filter element. The filter element has an Entegris brand filter element with a pore size of 0.05 μm.
2.4.8Chemical liquid supply: The chemical liquid HCl and H2O2 are accurately supplied by the metering pump. The program can set the interval time and each supply amount of the metering pump to replenish the chemical liquid;
2.4.9硅片托架材质：耐酸碱、高温、长寿命、不沾污槽内液体及硅片。
2.4.9 Hot pure water tank: Process heating temperature: (40 ~ 80) ± 5 ℃, the program can set the heating time point.
2.4.10洗槽自冲洗功能:换液前需注满纯水循环冲洗一次(可以人为设定是否需要冲洗)。
2.4.10The self-flushing function of the cleaning tank: it needs to be filled with pure water and rinsed once before the liquid is changed (you can manually set whether to rinse or not).
2.5冲水槽：技术参数
2.5 Rinse tank: technical parameters
2.5.1冲水槽温度：室温。
2.5.1 Temperature of rinse tank: room temperature.
2.5.2槽体材质：GE石英（HF槽后冲水槽使用PTFE材质）。
2.5.2 Tank material: GE quartz (PTFE material is used for the rinsetank after the HF tank).
2.5.3纯水槽无硅片流量满足：1 ~ 2 L/min。
2.5.3 The flow rate of rinsetank without silicon wafer is 1 ~ 2 L / min.
2.5.4纯水槽有硅片流量满足：> 30 L/min。
2.5.4The flow rate of rinsetank with silicon wafer is more than 30L / min.
2.5.5快速喷淋流量满足：> 30 L/min。
2.5.5 The rapid spray flow rate is more than 30 L / min.
2.5.6快速排空要求：≤5min。
2.5.6 Requirements for fast emptying: ≤ 5 min.
2.5.7纯水节省功能：纯水排可回收，排水管路与酸碱化学液排放管路分开。
2.5.7 Pure water saving function: the pure water drain can be recycled, and the drain pipeline is separated from the acid-base chemical liquid discharge pipeline.
2.5.8 megasound function: frequency is about 950 kHz, power matching, with 24-hour continuous working ability.
2.5.9硅片托架材质：耐酸碱、高温、长寿命、不沾污槽内液体及硅片。
2.5.9 Silicon wafer bracket material: acid and alkali resistance, high temperature, long life, no contamination of the liquid in the tank and silicon wafer.
2.6臭氧溢流槽：技术参数
2.6 Ozone tank: technical parameters
2.6.1臭氧水温度：室温
2.6.1 Ozone waterTemperature: room temperature
2.6.2槽体材质：GE石英
2.6.2 Tank material: GE quartz
2.6.3流量：最大可设定值不低于10 L/min
2.6.3 Flow rate: the maximum settable value is not less than 10 L/min
2.6.4臭氧供应：臭氧槽内臭氧浓度为20 ppm。
2.6.4 Ozone supply: The ozone concentration in the ozone tank is 20 ppm.
2.6.5硅片托架材质：耐酸碱、高温、长寿命、不沾污槽内液体及硅片。
2.6.5 Silicon wafer bracket material: acid and alkali resistance, high temperature, long life, no contamination of the liquid and silicon wafer in the tank.
2.7.3Circulation pipeline: There are online heaters and filtering devices. The components in the circulation system and the circulation pipelines, joints, valves, sealing rings, etc. have the characteristics of resisting chemical corrosion, and do not introduce any contamination.
2.7.4循环量：最大可设定值不低于18 L/min。
2.7.4Flow rate: the maximum settable value is not less than 18L/min.
2.7.5过滤器：循环系统加装过滤器，安装孔径为0.1 μm的Entegris品牌滤芯。
2.7.5Filter: Install a filter in the circulation system, and leave enough space to facilitate the replacement of the filter element. The filter element has an Entegris brand filter element with a pore size of 0.1μm.
2.7.6 Chemical liquid supply: The chemical liquid HF is accurately supplied by a metering pump. The program can set the interval time and each supply amount of the metering pump to replenish the chemical liquid; there is a chemical liquid concentration meter, which automatically replenishes the liquid according to the concentration.
2.7.7硅片托架材质：耐酸碱、高温、长寿命、不沾污槽内液体及硅片。
2.7.7 Silicon wafer bracket material: acid and alkali resistance, high temperature, long life, no contamination of the liquid in the tank and the silicon wafer.
2.7.8槽体上盖：上盖主体为耐高温材料，长期使用不变形，且不对清洗造成污染。
2.7.8 Tank body upper cover: The main body of the upper cover is made of high temperature resistant material, which will not deform after long-term use and will not cause pollution to cleaning.
2.8慢提拉
2.8 HOT DI DRY
2.8.1纯水槽温度：稳定时(40 ~60) ± 5℃
2.8.1 Pure water tank temperature: when stable (40 ~ 60) ± 5 ℃
2.8.2槽体材质：GE石英
2.8.2 Tank material: GE quartz
2.8.3纯水槽无硅片流量满足：1 ~ 2 L/min
2.8.3 Flow rate: the maximum settable value is not less than 18L/min
2.8.4机械手到位前纯水槽流量满足：> 8 L/min
2.8.4 The flow of pure water tank before the arrival of the manipulator meets:> 8 L/min.
2.8.5纯水节省功能：纯水排可回收，排水管路与酸碱化学液排放管路分开。
2.8.5Pure water saving function: the pure water drain can be recycled, and the drain pipeline is separated from the acid-base chemical liquid discharge pipeline.
2.8.6硅片托架材质：耐酸碱、高温、长寿命、不沾污槽内液体及硅片。
2.8.6Silicon wafer bracket material: acid and alkali resistance, high temperature, long life, no contamination of the liquid in the tank and the silicon wafer.
2.9红外干燥
2.9 Infrared drying
2.9.1红外干燥槽温度：稳定时(40 ~80) ± 1℃
2.9.1 Infrared drying tank temperature: when stable (40 ~ 80) ± 1 ℃
2.9.2槽体材质：GE石英，外槽材质：HT-PVC
2.9.2 Tank material: GE quartz, outer tank material: HT-PVC
2.10 UNLOADING: Unloadingafter drying, 4 six-inch baskets, and4 eight-inch baskets, are PFA baskets produced by Entegris, equipped with static elimination devices (the requirements for static elimination are the same as the LOADING position). Automatic wafer transfer device is required for 6-inch wafer.
2.11 Manipulator: The manipulator automatically recognizes the presence of silicon wafers, clamps the silicon wafers in the wafer basket and transfers them. After the silicon wafers are taken from the chemical tank, they must be opened and closed several times in the flushing tank for self-purification. Scheduling between manipulator does not affect production efficiency.
2.12隔离升降门：配备自动升降门板对臭氧槽、SC-1槽、SC-2槽空间进行隔离。
2.12 Isolation door: equipped with automatic door panel to isolate the space of ozone tank, SC-1 tank and SC-2 tank.
2.13配备纯水枪和氮气枪，可以覆盖到设备两端。
2.13 Equipped with pure water gun and nitrogen gun, which can cover both ends of the equipment.
2.14设备内部配备层流罩，覆盖整机范围，洁净度达到一级。
2.14 The equipment is equipped with a laminar flow hood to cover the whole range of the machine, and the cleanliness reaches the ISO CLASS3 purification.
*2.15设备端进水配置纯水过滤器DIW BOX。
*2.15Pure water filter (DIW box) is installed at the inlet of the equipment.
4. Equipment operating system: The manipulator can be manually operated through the touch screen to realize the circulation of silicon wafers in each cleaning tank, and realize the functions of discharge, addition, overflow, spraying and so on.
*5、清洗产能指标：≥22万片/月（每组两盒硅片,按每月工作28天，每天工作22小时计算）
*5. Cleaning capacity: ≥ 220,000 wafers/month (two boxes of silicon wafers per group; calculated based on working 28 days a month and working 22 hours a day)
*6、质量要求：
*6. Quality requirements:
硅片表面颗粒（八英寸）:
Surface particles of silicon wafer (eight inches):
测试设备为SP1-TBI（或者SP2），测试模式为Oblique（PUU），边缘排除3mm。
The test equipment is SP1-tbi (or SP2), the test mode is oblique(PUU), and edge exclusion 3mm.
≥0.16μm颗粒≤15个/片；或≥0.16μm颗粒增加量≤5个/片。
≥0.16μm particles ≤15/wafer, or ≥0.16μmparticles increase≤5/wafer.
≥0.1μm颗粒≤20个/片；或≥0.10 μm颗粒增加量≤10个/片。
≥0.1μm particles ≤15/wafer, or ≥0.1μmparticles increase≤10/wafer.
≥0.065μm颗粒≤50个/片；或≥0.065 μm颗粒增加量≤30个/片。
≥0.065μm particles ≤50/wafer, or ≥0.065 μmparticles increase≤30/wafer.
硅片表面金属含量≤5*E9atoms/cm2。
Surface metal content of silicon wafer≤5*E9 atoms/cm2.
*7、辅助条件
*7. Auxiliary conditions
7.1电源:电压380 V(三相)，频率50Hz
7.1 power supply: voltage 380 V (three-phase), frequency 50 Hz
7.2 机械手及PLC控制电源使用UPS电源。
7.2 the manipulator and PLC control power supply uses UPS power supply.
8、设备可靠性要求：
8. Equipment reliability requirements:
Table 2 Equipment reliability requirements
No.
项目Item
指标Target
1
碎片率
Fragmentation rate
0.1次/月
0.1 times / month
2
MTBF
>1000 hours
3
MTTR
<4 hours
4
维护周期
Maintenance cycle
1次/月，维护时间：1小时/次。
Once / month, maintenance time: 1 hour / time
5
响应时间
response time
24小时内响应，48hours内入厂检修,或电话等方式进行沟通解决问题。
Response within 24 hours, in plant maintenance within 48 hours, or telephone communication to solve the problem.
